| 000 | 00936cam^a2200289^^^4500 | ||
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| 001 | UDM01000017298 | ||
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| 005 | 20210527173959.0 | ||
| 008 | 950720s1975^^^^nyu^^^^^r^^^^^00010^eng^d | ||
| 082 | 0 | 4 |
_a660.28 _bW467m 1975 |
| 100 | 1 |
_923859 _aWen, C. Y, _eautor |
|
| 245 | 1 | 0 |
_aModels for flow systems and chemical reactors / _cby C. Y. Wen and L. T. Fan. |
| 264 | 3 | 1 |
_aNew York : _bM. Dekker, _c1975. |
| 300 | _a570 páginas | ||
| 336 |
_atexto _btxt _2rdacontent |
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| 337 |
_ano mediado _bn _2rdamedia |
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| 338 |
_avolumen _bnc _2rdacarrier |
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| 490 | 0 |
_aChemical processing and engineering ; _v3. |
|
| 650 | 1 | 4 |
_923861 _aFluidización. |
| 650 | 1 | 4 |
_923862 _aIngeniería química _xAparatos y accesorios. |
| 650 | 1 | 4 |
_96729 _aReactores químicos. |
| 700 | 1 |
_923863 _aFan, L. T., _eautor |
|
| 942 |
_2ddc _cGEN |
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| 997 |
_aHZ _b00 _c20140722 _lUDM01 _h1007 |
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_aBATCH-UPD _b00 _c20150317 _lUDM01 _h2234 |
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_c14438 _d14438 |
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| 900 | _aMYM | ||